SAN JOSE, Calif. — KLA-Tencor Corp. has rolled out its new reticle defect inspection system. Targeted for the 2x-nm logic (3x-nm half-pitch memory) node, the new Teron 600 platform brings programmable ...
May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...
NexTech Solutions, Inc. (Pink Sheets:NXSN) today announced shipment of the ORION fully automated reticle inspection system providing macro inspection of semiconductor reticles. The order was placed by ...
SAN JOSE, Calif. — Raising the bar in photomask inspection, KLA-Tencor Corp. has rolled out a new tool for use in 32-nm mask production. The tool, dubbed the TeraScanXR, is an extension of the company ...
NexTech Solutions (Pink Sheets:NXSN) announced it recently received product acceptance for their ORION Reticle Inspection System from one of the world's largest semiconductor manufacturers. Orion is a ...
TOKYO--(BUSINESS WIRE)--Applied Materials, Inc. today released its Applied Tetra ™ Reticle Clean, the industry’s only wet clean system that delivers damage-free, >99% particle removal efficiency for ...
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