An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...

NexGen Wafer Systems is excited to announce the launch of SERENO, its latest multi-chamber platform designed for Wet Etch and Clean applications. SERENO combines high performance with exceptional ...

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...

Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...

Researchers have found a more efficient fabricating process to produce semiconductors used in today's electronic devices. They also confirmed that materials other than silicon can be used successfully ...

In today's industries, quality inspection in semiconductor manufacturing is critical. Many traditional fault detection and diagnosis techniques have been developed to determine the existence of trends ...

Parfuse Corporation, a long-established aluminum fabrication and metal joining company based in Westbury, New York, announced a renewed focus on strengthening its local partnerships across Garden City ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...